电压调谐磁控管
The Effect of Process Parameters on Plasma Environment of RF Magnetron Sputtering PTFE Target With Negative Pulse-Voltage Bias
工艺参数对射频磁控溅射PTFE靶形成的等离子体组成的影响
For stable operation of the magnetron, the preoscillation voltage should be lower than ehe threshold voltage, while the mode of this space charge oscillation should be the same as the π mode oscillation on the resonating cavities.
为了使磁控管能稳定工作,就要使预振电压低于门槛电压,并且使空间电荷振荡的模式与谐振腔上高频振荡的π模同步。
Pure Cr coatings were deposited under different target voltage and bias voltage& duty cycle by closed-field unbalanced magnetron sputtering.
本文采用闭合场非平衡磁控溅射离子镀技术在不同的靶电压、偏压、占空比下制备了纯Cr镀层。
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